Researchers have formed perovskite films from a seed layer grown with atomic layer deposition, an standard technology for dielectric materials.
Due to their unique properties these fascinating materials are predicted to possess a complete photonic bandgap without any long-range order.
Company announces aquisition assests of former leader in atomic layer deposition (ALD) solutions.
As the applications of nanotechnology grow more sophisticated, the controlled deposition of exceedingly thin layers of materials becomes of ever growing importance. A well-known technique called atomic layer deposition (ALD) can meet this challenge quite well for the deposition of thin inorganic oxide films. Using this method, films can be deposited one atomic layer at […]
The German Vacuum Society and the German Physical Society have honored Dr. Mato Knez for his exceptional achievements in the development of new concepts for materials synthesis on the nano and microscale via atomic layer deposition.